Title:

Adsorption of arsenic on granular ferric hydroxide (GEH®). Impact of initial concentration of arsenic(V) on kinetics and equilibrium state

Group publication title:

Environment Protection Engineering

Creator:

Saldaña-Robles, Adriana ; Saldaña-Robles, Alberto ; Márquez-Herrera, Alfredo ; de la Luz Ruiz-Aguilar, Graciela Ma ; Saldaña-Robles, Noé

Contributor:

Majewska-Nowak, Katarzyna Maria. Redakcja

Subject and Keywords:

ochrona środowiska ; inżynieria środowiska ; czasopisma

Description:

Environment Protection Engineering. Vol. 44, 2018, nr 3, s. 51-62

Abstrakt:

The present study discusses the adsorption kinetics of arsenic(V) on granular ferric hydroxide (GEH) and the GEH adsorption capacity for arsenic(V) at equilibrium. The impact of temperature on GEH adsorption capacity was studied, as well as the effects of the initial concentration of arsenic(V) and GEH concentration on the adsorption rates of arsenic(V). The Freundlich isotherm describes the arsenic(V) adsorption behavior reasonably well (r2 > 0.965). The adsorption kinetics was studied by fitting the experimental data to both first-order and second-order models. The maximum adsorption capacity of arsenic(V) on GEH was 2.701 mg·g–1, which is higher than the adsorption capacities of other adsorbents reported. The kinetics of arsenic(V) adsorption was well defined by the second-order model, with the correlation coefficients in the range of 0.960–0.987. This study shows that due to its properties, GEH is a good candidate for removal of arsenic(V) from groundwater.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2018

Resource Type:

artykuł

Resource Identifier:

doi:10.5277/epe180304

Source:

<sygn. PWr A4232I> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Environment Protection Engineering ; Environment Protection Engineering. Vol. 44, 2018 ; Environment Protection Engineering. Vol. 44, 2018, nr 3

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska