Title:

Optical switch based on cascaded SOI nonlinear directional coupler

Group publication title:

Optica Applicata

Creator:

Tao, Qing ; Luo, Fengguang ; Cai, Dusi ; Liang, Qianliang ; Wan, Zhengwen ; Song, Xinming ; Liu, Xuechao

Contributor:

Gaj, Miron. Redakcja ; Urbańczyk, Wacław. Redakcja

Subject and Keywords:

optyka ; silicon-on-insulator (SOI) ; vector finite element ; discrete split-step multi-wavelet transfor-mation ; coupled nonlinear Schrödinger equation (CNLSE)

Description:

Optica Applicata, Vol. 41, 2011, Nr 3, s. 669-678

Abstrakt:

In this paper, we calculate three effective refractive indexes for cascaded silicon-on-insulator (SOI) nonlinear directional coupler. For each effective refractive index, the coupling length LC, core-to-distance-ratio K and switching threshold power Pi, m are calculated, respectively. However, there are some fabrication errors, which are ΔW, ΔH, ΔK in the height of Si layer and width of Si layer and error of core-to-distance-ratio. We have analyzed the influence of power transmission efficiency Ti, j and relative transmission efficiency error Δi, j caused by the change of ΔW, ΔH, ΔK. Furthermore, we find the tolerance range of ΔW, ΔH, ΔK for Ti, j and Δi, j in couplers a, b, c. The other four input pulses with different powers are switched to four different ports. Although output pulses show some little compression and loss, the value of η is very small and output pulse waveforms are not affected seriously. The basic switching function has been realized, so this design is proved to be effective.

Publisher:

Oficyna Wydawnicza Politechniki Wrocławskiej

Place of publication:

Wrocław

Date:

2011

Resource Type:

artykuł

Source:

<sygn. PWr A3481II> ; click here to follow the link ; click here to follow the link

Language:

eng

Relation:

Optica Applicata ; Optica Applicata, Vol. 41, 2011 ; Optica Applicata, Vol. 41, 2011, Nr 3 ; Politechnika Wrocławska. Wydział Podstawowych Problemów Techniki

Rights:

Wszystkie prawa zastrzeżone (Copyright)

Access Rights:

Dla wszystkich w zakresie dozwolonego użytku

Location:

Politechnika Wrocławska